Dynacool 14 T PPMS:
- 1.9-400 K, ±14 T
- DC Resistivity, 4-wire resistivity and van der Pauw switch module
- AC Transport measurement module: AC Resistivity, 4 or 5-wire AC Hall Effect or I-V Curve High-resolution computer-controlled horizontal sample rotator (−10° to 370°)
- He-3 insert, 0.5 K base continuous, 0.4 K one-shot mode, 6μW cooling @ 0.5K, 80μW @ 1K
High-Entropy thin film deposition
Laser ablation tool:
- High temperature manipulator; in situ target exchange
- RF oxygen plasma
- RHEED; UHV construction
- Designed for flexible multi-user use.
- Open to users with and beyond the MRSEC IRGs.
Coming on line summer 2024 - Sputtering system:
- High-temperature manipulator
- Six-cathode source cluster
- Ozone gas source
- RF, pulsed-DC, and HiPIMS plasma drives
- In situ ellipsometry
- UHV construction
- Additional compositional flexibility
- System designed for automated data acquisition
- System will accommodate combinatorial synthesis
- Enable machine learning assisted synthesis